Preparation, characterization and electrochemical properties of boron-doped diamond films on Nb substrates

Yu, Zhi-ming, Wang, Jian, Wei, Qiu-ping , Meng, Lingcong, Hao, Shi-meng and Long, Fen (2013) Preparation, characterization and electrochemical properties of boron-doped diamond films on Nb substrates. Transactions of Nonferrous Metals Society of China, 23 (5). pp. 1334-1341. ISSN 1003-6326

Full content URL: https://doi.org/10.1016/S1003-6326%2813%2962601-1

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Item Type:Article
Item Status:Live Archive

Abstract

A series of boron-doped polycrystalline diamond films were prepared by hot filament (HF) chemical vapor deposition on Nb substrates. The effects of B/C ratio of reaction gas on film morphology, growth rate, chemical bonding states, phase composition and electrochemical properties of each deposited sample were studied by scanning electron microscopy, Raman spectra, X-ray diffraction, microhardness indentation, and electrochemical analysis. Results show that the average grain size of diamond and the growth rate decrease with increasing the B/C ratio. The diamond films exhibit excellent adhesion under Vickers microhardness testing (9.8 N load). The sample with 2% B/C ratio has a wider potential window and a lower background current as well as a faster redox reaction rate in H2SO4solution and KFe(CN)6 redox system compared with other doping level electrodes.

Keywords:diamond film, hot filament chemical vapor deposition (HFCVD), boron doping, electrochemical behavior, niobium substrate, electrode
Divisions:College of Science > School of Chemistry
ID Code:47291
Deposited On:12 Nov 2021 16:40

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