Abstract

Our objective was to investigate the determinants of genetic variation in N accumulation, N partitioning and N remobilization to the grain post-flowering and associations with flag-leaf senescence, grain yield and grain N% in 16 wheat cultivars grown under high N (HN) and low N (LN) conditions in the UK and France. Overall, cultivars ranged in leaf lamina N accumulation at anthesis from 5.32 to 8.03 g N m−2 at HN and from 2.69 to 3.62 g N m−2 at LN, and for the stem-and leaf-sheath from 5.45 to 7.25 g N m−2 at HN and from 2.55 to 3.41 g N m−2 at LN (P < 0.001). Cultivars ranged in N partitioning index (proportion of above-ground N in the crop component) at anthesis for the leaf lamina from 0.37 to 0.42 at HN and 0.34 to 0.40 at LN; and for the stem-and leaf-sheath from 0.39 to 0.43 at HN and from 0.35 to 0.41 at LN (P < 0.001). The amount of leaf lamina N remobilized post-anthesis was negatively associated with the duration of post-anthesis flag-leaf senescence amongst cultivars in all experiments under HN. In general, it was difficult to separate genetic differences in lamina N remobilization from those in lamina N accumulation at anthesis. Genetic variation in grain yield and grain N% (through N dilution effects) appeared to be mainly influenced by pre-anthesis N accumulation rather than post-anthesis N remobilization under high N conditions and under milder N stress (Sutton Bonington LN). Where N stress was increased (Clermont Ferrand LN), there was some evidence that lamina N remobilization was a determinant of genetic variation in grain N% although not of grain yield. Our results suggested that selection for lamina N accumulation at anthesis and lamina N remobilization post-anthesis may have value in breeding programmes aimed at optimizing senescence duration and improving grain yield, N-use efficiency and grain N% of wheat.