Fabrication of three-dimensional stamps for embossing techniques by lithographically controlled isotropic wet etching

Tormen, Massimo and Carpentiero, Alessandro and Vaccari, Lisa and Altissimo, Matteo and Ferrari, Enrico and Cojoc, Dan and Di Fabrizio, Enzo (2005) Fabrication of three-dimensional stamps for embossing techniques by lithographically controlled isotropic wet etching. Journal of Vacuum Science and Technology B, 23 (6). pp. 2920-2924. ISSN 1071-1023

Full content URL: http://avspublications.org/jvstb/resource/1/jvtbd9...

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Item Type:Article
Item Status:Live Archive

Abstract

The excellent characteristics that nanoimprint lithography (NIL) shows as a two-dimensional patterning technique, such as resolution and throughput, are shared with its three-dimensional (3D) structuring version. Nevertheless, the potentialities of NIL for 3D structuring remain largely unexplored and unexploited, hindered by the difficulties in the fabrication of high quality masters with throughput suitable for practical purposes. We present a technique that allows production of stamps with tightly controlled three-dimensional profiles in the 10 nm–100 μm scale range. This technique consists of a sequence of lithographic steps alternated with isotropic wet etching processes performed on a quartz substrate. Scanning electron microscopy and atomic force microscopy characterization shows that 3D structures with very accurate shape control and nanometer scale surface roughness can be formed with this method. Quartz stamps have been employed in nanoimprint, hot embossing, or casting processes to shape complex plastic elements. This technique is expected to have many applications in different nanotechnology-related fields such as optics, nanomechanics, microfluidics, and plasmon nano-optics.

Keywords:micro-lenses
Subjects:F Physical Sciences > F310 Applied Physics
J Technologies > J522 Photo-Lithography
Divisions:College of Science > School of Life Sciences
ID Code:8388
Deposited On:30 Mar 2013 14:49

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