The influence of process gas type on the enamel surface condition of a high power diode laser generated single-stage ceramic tile grout seal

Lawrence, Jonathan and Li, Lin and Edwards, Roger E. and Gale, Andrew G. (2002) The influence of process gas type on the enamel surface condition of a high power diode laser generated single-stage ceramic tile grout seal. Surface and Coatings Technology, 160 (1). pp. 7-13. ISSN 0257-8972

Documents
Paper_44.pdf
[img]
[Download]
[img]
Preview
PDF
Paper_44.pdf - Whole Document

950Kb

Official URL: http://dx.doi.org/10.1016/S0257-8972(02)00345-6

Abstract

Almost all laser materials processing operations require the simultaneous use of an process or assist gas. This paper examines the use of O2, Ar, N2 and He as process gasses during the firing of a vitreous enamel to form a single-stage ceramic tile grout seal with a high power diode laser (HPDL) and the effects thereof on the surface condition of the glaze. The findings revealed marked differences in the surface condition of the HPDL generated enamel glaze depending upon the process gas used. The use of O2 as the process gas was seen to result in glazes with far fewer microcracks and porosities than those generated with any of the other three gasses, particularly He. Such differences were found to be due to the ability of the smaller O2 gas molecules to dissolve molecularly into the open structure of the HPDL generated enamel glaze and also, the inherent reactiveness of O2 which consequently effects exothermic reactions when it is used as a process gas. Both occurrences were seen, in turn, to affect the cooling rate and therefore the tendency of the molten glaze to generate microcracks when cooled.

Item Type:Article
Additional Information:Almost all laser materials processing operations require the simultaneous use of an process or assist gas. This paper examines the use of O2, Ar, N2 and He as process gasses during the firing of a vitreous enamel to form a single-stage ceramic tile grout seal with a high power diode laser (HPDL) and the effects thereof on the surface condition of the glaze. The findings revealed marked differences in the surface condition of the HPDL generated enamel glaze depending upon the process gas used. The use of O2 as the process gas was seen to result in glazes with far fewer microcracks and porosities than those generated with any of the other three gasses, particularly He. Such differences were found to be due to the ability of the smaller O2 gas molecules to dissolve molecularly into the open structure of the HPDL generated enamel glaze and also, the inherent reactiveness of O2 which consequently effects exothermic reactions when it is used as a process gas. Both occurrences were seen, in turn, to affect the cooling rate and therefore the tendency of the molten glaze to generate microcracks when cooled.
Keywords:High power diode laser (HPDL), Ceramic, Tile, Grout, Gas, Glaze
Subjects:H Engineering > H680 Optoelectronic Engineering
H Engineering > H700 Production and Manufacturing Engineering
Divisions:College of Science > School of Engineering
ID Code:3260
Deposited By:INVALID USER
Deposited On:05 Sep 2010 20:04
Last Modified:13 Mar 2013 08:45

Repository Staff Only: item control page