Comparison of contamination model predictions to LDEF surface measurements

Rantanen, Raymond and Gordon, Tim and Finckenor, Miria M. and Pippin, Harold G. (1998) Comparison of contamination model predictions to LDEF surface measurements. In: Optical Systems Contamination and Degradation, July 19, 1998, San Diego, CA.

Full content URL: http://dx.doi.org/10.1117/12.328498

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Item Type:Conference or Workshop contribution (Paper)
Item Status:Live Archive

Abstract

Contaminant deposition measurements have been made on species content and depth profiles on three experiment trays from the Long Duration Exposure Facility (LDEF). Auger, Argon sputtering, ESCA and SEM analysis was used to define the contaminant deposits. The Integrated Spacecraft Environments Model (ISEM) was used to predict the deposition levels of the contaminants measured on the three trays. The details of the modeling and the assumptions used are presented along with the predictions for the deposition on select surfaces on the trays. These are compared to the measured results. The trays represent surfaces that have a high atomic oxygen flux, an intermediate oxygen flux, and no oxygen flux. All surfaces received significant solar UV flux. It appears that the atomic oxygen is necessary for significant deposition to occur. Surfaces that saw significant contaminant flux, solar UV and no atomic oxygen did not show any appreciable levels of observable deposition. The implications of the atomic oxygen interaction with contaminant deposits from silicon contaminant sources is discussed. The primary contaminant sources in the LDEF analysis are DC6-1104 adhesive and Z-306 paint. The results and interpretation of the findings have a potential significant impact on spacecraft surfaces that are exposed to solar UV and atomic oxygen in low Earth orbit.

Additional Information:Optical Systems Contamination and Degradation. Conference Code:59646
Keywords:Adhesives, Argon, Computer simulation, Contamination, Deposition, Earth (planet), Forecasting, Orbits, Oxygen, Paint, Scanning electron microscopy, Silicon, Spacecraft, Sputtering, Atomic oxygen flux, Molecular contamination, Surface measurement
Subjects:H Engineering > H100 General Engineering
H Engineering > H330 Automotive Engineering
Divisions:College of Science > School of Engineering
ID Code:11683
Deposited On:03 Oct 2013 20:43

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